March 31st
EVENTS
Mask aligner UX-4 Series Full Field Projection
1 x projection aligner,
non-contact, productive.
This projection aligner uses our unique large field projection lens technology, light source and other optical technologies developed by Ushio over many years. Provides one-shot exposure of up to 8-inch wafers without touching the mask. Large depth of field enables proper exposure of non-flat wafers, achieving higher productivity and yield; not possible with a proximity aligner.
Mask aligner UX-4 Series MOVIE
PLAY MOVIE
Features
Mask damage free
The projection lithography tool causes no damage to the mask because it has no contact between the mask and the wafer. We developed the optical system that allows exposure of a large field with low lens distortion, suitable for high-volume production with high yield and low maintenance cost, something not with possible proximity/contact mask aligners.
High Productivity
In addition to the mask maintenance cost, the exposure field size of this projection mask aligner is for a whole wafer and throughput will be better than steppers. Total CoO(Cost of Ownership) will be the best compared to proximity/contact mask aligners and steppers.
Mask compatibility
Customer's existing masks for conventional aligners can be used for UX-4. No special mask is needed.
